Albanny NanoTech获得联邦8.25亿美元的资金,用于半导体行业的改进,重点是EUV平面印刷。 Albany NanoTech receives $825m in federal funding for semiconductor industry enhancement, focusing on EUV lithography.

纽约的奥尔巴尼纳诺科技综合体被指定为三个国家技术中心之一,获得联邦资金8.25亿美元,用于加强美国半导体工业。 The Albany NanoTech complex in New York has been designated as one of three national technology centers, receiving up to $825 million in federal funding to enhance the U.S. semiconductor industry. 它将侧重于极端紫外线(EUV)平面印刷,这是主要的芯片制造技术。 It will focus on extreme ultraviolet (EUV) lithography, the leading chip-making technology. 这一倡议是《CHIPS和科学法》的一部分,旨在帮助美国生产20%的世界先进芯片,并加强其全球竞争力。 This initiative, part of the CHIPS and Science Act, aims to help the U.S. produce 20% of the world's advanced chips and strengthen its global competitiveness.