欧盟在比利时启动了2.5B欧元芯片试点,利用EUV平面印刷法开发亚二nm半导体,增强欧洲的技术独立性。 The EU launched a €2.5B chip pilot in Belgium to develop sub-2nm semiconductors using EUV lithography, boosting Europe’s tech independence.

欧洲联盟在比利时卢文启动了25亿欧元的纳米信息中心试验线,这是欧盟《芯片法》规定的最大试验线,目的是利用极端紫外线平面印刷法,将下一代半导体技术推进到2纳米以下。 The European Union has launched the €2.5 billion NanoIC pilot line in Leuven, Belgium, the largest under the EU Chips Act, to advance next-generation semiconductor technology below 2 nanometers using extreme ultraviolet lithography. 该项目由 imec 主办，并获得欧盟、各国政府及如 ASML 等行业合作伙伴 7 亿欧元的支持，向初创企业、研究人员和公司开放，用于原型开发用于人工智能、6G 和医疗领域的先进芯片。 Hosted at imec and backed by €700 million from the EU, national governments, and industry partners like ASML, it offers open access to startups, researchers, and companies for prototyping advanced chips for AI, 6G, and healthcare. 该设施是37亿欧元的欧盟半导体创新努力的一部分,它支持欧洲加强供应链复原力和减少对外国芯片生产的依赖的目标。 The facility, part of a €3.7 billion EU semiconductor innovation effort, supports Europe’s goal to strengthen supply chain resilience and reduce reliance on foreign chip production.