中国制造了原型EUV平面印刷机,在全球限制下推进芯片独立。 China builds prototype EUV lithography machine, advancing chip independence amid global restrictions.

2025年初,深圳的中国研究人员完成了一个极端紫外线(EUV)平面照相机原型,这是荷兰反向工程公司ASML技术生产先进的半导体芯片的关键一步。 In early 2025, Chinese researchers in Shenzhen completed a prototype extreme ultraviolet (EUV) lithography machine, a key step in producing advanced semiconductor chips, by reverse-engineering Dutch company ASML’s technology. 该机器由前ASML工程师建造,产生EUV光,在工厂地板上运作,但尚未生产工作芯片。 Built by former ASML engineers, the machine generates EUV light and operates on a factory floor but has not yet produced working chips. 该项目是习近平主席顾问丁薛祥领导的一项为期六年的全国努力的一部分,涉及华卫和州级实验室,目的是在美国和荷兰的出口管制下实现半导体自给自足。 The project, part of a six-year national effort led by President Xi Jinping’s advisor Ding Xuexiang and involving Huawei and state labs, aims to achieve semiconductor self-sufficiency amid U.S. and Dutch export controls. 虽然中国仍面临重大技术挑战,特别是在精确成分方面,但突破表明,进展可能比过去对长达十年的时限的估计要快,一些专家预测到2030年将有一个工作芯片。 While China still faces major technical challenges, particularly in precision components, the breakthrough suggests progress may be faster than earlier estimates of a decade-long timeline, with some experts now projecting a working chip by 2030.