Imec 质量生产超小型、统一的纳米粒子,使用EUV平面印刷法,推进基因组学和医学的生物传感器。 Imec mass-produces ultra-small, uniform nanopores using EUV lithography, advancing biosensors for genomics and medicine.

Imec在300毫米硅裂谷上利用EUV平面印刷法首次生产了固态纳米孔径,从而能够大规模生产10纳米以下的高度统一纳米孔径,其体积可能低于5纳米。 Imec has achieved the first wafer-scale production of solid-state nanopores using EUV lithography on 300mm silicon wafers, enabling mass production of highly uniform nanopores as small as 10 nanometers with potential for sizes below 5nm. 与CMOS兼容的进程克服了以往的可缩放性和可变性挑战,产生了6.2的信号对噪音比率,表明在探测分子转移位置方面表现良好。 The CMOS-compatible process overcomes past scalability and variability challenges, yielding a signal-to-noise ratio of 6.2, indicating strong performance for detecting molecular translocations. 这一突破为高通量生物传感器阵列铺平了道路,在基因组学、诊断学、个性化医学和分子数据储存方面应用高通量生物传感器阵列,将纳米质技术从实验室研究转变为实际的大规模使用。 This breakthrough paves the way for high-throughput biosensor arrays with applications in genomics, diagnostics, personalized medicine, and molecular data storage, transforming nanopore technology from lab research to practical, large-scale use.