随着各国扩大AI和5G的芯片制造,全球对EUV平面印刷的需求正在上升。 Global demand for EUV lithography is rising as nations expand chip manufacturing for AI and 5G.

随着包括日本、德国、印度、印度尼西亚、中国和法国在内的国家加速半导体制造以满足对AI、5G和IoT中先进芯片不断增长的需求,全球对极端紫外线(EUV)平面印刷的需求正在迅速上升。 Global demand for extreme ultraviolet (EUV) lithography is surging as countries including Japan, Germany, India, Indonesia, China, and France accelerate semiconductor manufacturing to meet rising needs for advanced chips in AI, 5G, and IoT. 在政府支持、研发投资和战略伙伴关系的推动下,这些国家正在扩大采用欧盟V,以便在7nm和7nm以下生产较小、更有效率的微芯片。 Driven by government support, R&D investments, and strategic partnerships, these nations are expanding EUV adoption to produce smaller, more efficient microchips at 7nm and below. 尽管面临高成本和技术复杂性等挑战,但欧盟V型设备、材料和基础设施的进步正在提高产量和绩效,使这些国家成为全球半导体行业的主要参与者。 Despite challenges like high costs and technical complexity, advancements in EUV equipment, materials, and infrastructure are boosting yields and performance, positioning these countries as key players in the global semiconductor industry.