中国SMIC测试土生土长的7nm芯片深紫外线照相机,目的是减少对美国和荷兰技术的依赖。 China's SMIC tests homegrown deep UV lithography machine for 7nm chips, aiming to cut reliance on U.S. and Dutch tech.

中国的SMIC正在测试第一台国内建造的深紫外线平面照相机,由上海初创Yulangsheng公司研制,标志着半导体制造业在自力更生方面取得进展。 China's SMIC is testing its first domestically built deep ultraviolet lithography machine, developed by Shanghai startup Yuliangsheng, marking progress toward self-reliance in semiconductor manufacturing. 该机器旨在支持7nm的生产,并可能扩大到5nm,尽管由于在调整方面存在挑战,产量仍然很低。 The machine aims to support 7nm production and potentially scale to 5nm, though yield rates remain low due to alignment challenges. 由AI公司不断增加的国内需求以及政府对内部技术的推动所推动的这项努力旨在减少对外国设备的依赖,特别是在美国持续出口限制的情况下对ASML设备的依赖。 This effort, driven by rising domestic demand from AI firms and government push for in-house tech, seeks to reduce dependence on foreign equipment, particularly from ASML, amid ongoing U.S. export restrictions.