SK Hynix引进了先进的EUV技术、收缩晶体管和加速记忆生成。 SK Hynix introduces advanced EUV tech, shrinking transistors and boosting memory production.

SK Hynix是第一个在韩国的M16工厂引进高NA EUV平面摄影技术用于大规模生产。 SK Hynix has become the first to introduce High NA EUV lithography technology for mass production at its M16 plant in South Korea. 这一新系统是ASML的TWINSCAN EXE:5200B,允许晶体管比现有的EUV系统小1.7倍,密度2.9倍。 This new system, ASML's TWINSCAN EXE:5200B, allows for transistors 1.7 times smaller and densities 2.9 times higher compared to existing EUV systems. SK Hynix旨在简化生产流程,加速下一代记忆开发,并用这一先进技术加强其市场地位。 SK Hynix aims to simplify production processes, accelerate next-gen memory development, and strengthen its market position with this advanced technology.