ULVAC和SAL伙伴为大规模薄膜硝酸锂制造开发等离子蚀刻。 ULVAC and SAL partner to develop plasma etching for large-scale thin-film lithium niobate manufacturing.

ULVAC和奥地利硅实验室(SAL)已合作开发大规模制造薄膜硝酸锂(TFLN)的等离子蚀刻工艺。 ULVAC and Silicon Austria Labs (SAL) have teamed up to develop plasma etching processes for manufacturing thin-film lithium niobate (TFLN) on a large scale. 这种材料由于效率高、损失低,对于先进的光学设备至关重要。 This material is crucial for advanced optical devices due to its high efficiency and low loss. 该伙伴关系利用ULVAC的等离子蚀刻系统,旨在改善TFLN的整合和可扩展性,满足对更高数据通信量日益增加的需求。 Using ULVAC's plasma etching system, the partnership aims to improve TFLN's integration and scalability, addressing the increasing demand for higher data communication volumes.